Botlagunta Preethish Nandan, & Subrahmanyasarma Chitta. (2023). Machine Learning Driven Metrology and Defect Detection in Extreme Ultraviolet (EUV) Lithography: A Paradigm Shift in Semiconductor Manufacturing. Educational Administration: Theory and Practice, 29(4), 4555–4568. https://doi.org/10.53555/kuey.v29i4.9495