BOTLAGUNTA PREETHISH NANDAN; SUBRAHMANYASARMA CHITTA. Machine Learning Driven Metrology and Defect Detection in Extreme Ultraviolet (EUV) Lithography: A Paradigm Shift in Semiconductor Manufacturing. Educational Administration: Theory and Practice, [S. l.], v. 29, n. 4, p. 4555–4568, 2023. DOI: 10.53555/kuey.v29i4.9495. Disponível em: https://kuey.net/index.php/kuey/article/view/9495. Acesso em: 15 mar. 2026.