Botlagunta Preethish Nandan and Subrahmanyasarma Chitta (2023) “Machine Learning Driven Metrology and Defect Detection in Extreme Ultraviolet (EUV) Lithography: A Paradigm Shift in Semiconductor Manufacturing”, Educational Administration: Theory and Practice, 29(4), pp. 4555–4568. doi: 10.53555/kuey.v29i4.9495.